Vacuum coating machine system

  Vacuum coating machine system

Vacuum coating machine plasma beam sputtering coating machine mainly by the rf plasma source, vacuum system, the electromagnetic coil (transmitter coil and convergence coil), bias power supply, vacuum chamber (including target material and the substrate, etc.), vacuum control system, etc. Its salient features are its plasma control system, plasma control system is a key part in coating machine, including rf plasma source located at the side of the vacuum chamber, and and sputtering target materials on the plasma source outlet below configuration with an electromagnetic coil respectively. When two coil direction through current, magnetic field coil synthesis will guide electronic along the magnetic field generated in plasma source direction, so that the plasma beam bound on the magnetic field direction. With a negative bias of target at the same time, make the sputtering ion in electric field under the action of accelerating impact target surface, produce sputtering.
Vacuum coating machine control system of plasma
Vacuum coating machine this coating machine has very flexible control mode, such as sputtering rate can be changed by adjusting the bias of target and the plasma source of rf power adjusted this two ways. Plasma generator and the separation of the vacuum chamber design is the key to the wide range controllable sputtering process parameters, and the broad range of control parameters makes the particular application access to the optimization of process parameters. In addition, you can through the control system of vacuum sputtering rate adjustment.
Vacuum coating machine as shown in the curve for the target current and bias, a constant current density when the sputtering rate and the relationship between the target bias, with constant current rf power is 500 w.