The development potential of vacuum plating equipment

   

  Vacuum plating equipment refers to a kind of need to be done under high vacuum coating, including vacuum ion evaporation, magnetron sputtering, MBE molecular beam epitaxy etc. A lot of kinds, but more common are two evaporation and sputtering. Evaporation coating is generally by heating target material to make the surface of target components form groups of atoms, or ions evaporate, make its settlement in the substrate surface, form a thin film through further film-forming process.
 For sputtering deposition, we can understand for the use of electronic or high-energy laser bombardment of target, and the surface components form groups of atoms, or ions was sputtering, and deposited on the substrate surface, through further film-forming process, eventually form a thin film. Two ways shall be carried out under the high vacuum environment, so called vacuum coating technology. Vacuum plating than traditional electroplating water, good development potential, the environmental pollution is small, low cost, make product metal sense is strong, high brightness, is widely used in various industries.