Vacuum coating machine equipment characteristics of the vacuum coating machine system

                       

  Vacuum coating machine in plasma beam sputtering, uniform sputtering ion etch target surface, and will not make the target surface oxidation. Compared with magnetron sputtering, the plasma beam is generated by the rf plasma source and the role of the magnetic field is the plasma beam convergence and deflection to the target surface, therefore, although plasma beam sputtering coating system also has a magnetic field, but its effect to the magnetic field does not control sputtering, which abandoned the magnetron sputtering caused by uneven magnetic field in the "magnetic control" shortcomings. In sputtering, after the completion of the target material utilization rate can be as high as above 90%.
  Vacuum coating machine, magnetron sputtering and plasma beam sputtering target surface etching after contrast figure. Due to greatly improve the utilization rate of target material, has solved the difficult to overcome shortcomings of magnetron sputtering, which results in uneven etching of the target poisoning
Vacuum coating machine in addition, magnetron sputtering produce sputtering runway due to uneven magnetic field on the back of the magnet, the magnetic field is prone to oxidation zone, so it is difficult to deposit of ferromagnetic materials, and in the plasma beam sputtering with no magnet as plasma constraint, ability of ferromagnetic material coating, and can use the thick target material, in figure 3 experimental cobalt metal thickness is 6 mm. For iron, nickel,  chromium and ferromagnetic compounds, plasma beam sputtering are also has a high sputtering rate.
A further advantage of application of the coating technology system, when the electromagnetic coil polarity reverse connection, due to the direction of the magnetic field produced change, plasma beam bombardment under the action of a magnetic field of the substrate, thus substrate cleaning action, as shown in figure 4. This can actually make the application of the technology of coating machine to omit conventional coating machine cleaning with ion source.