The formation of sputtering deposition technology is the use of vacuum glow discharge, accelerate the positive ions make its bombardment of sputtering target material surface phenomenon, make out the surface of the target material particle deposition to form a thin film to the substrate.
Working principle of evaporative coating is put membrane material in vacuum coating indoor, after evaporation source heating evaporation, when the evaporation molecular mean free path is greater than the linear dimensions of the vacuum coating chamber, the steam of atoms and molecules escape from the surface of the evaporation source, little impact of other molecules or atoms and the obstacles, can directly reach the plating surface of the substrate, due to the low substrate temperature, then condensation and film.
Tial principle is the use of vacuum arc discharge counts in the evaporation source technology, is the source of ignition under vacuum evaporation (cathode), and self sustaining formed between anode arc discharge, which emitted from the cathode arc light point cathode material of ions.
Vacuum coating machine company, points out that because of the current local concentration, lead to the joule heat to the cathode material partly ionization, such as explosive to bias in the work under the action of combined with the reaction gas, which is deposited on the workpiece surface is formed by plating layer.
没有评论:
发表评论